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CVD Tungsten

MOQ : piece

Lead Time : Days

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Product details

Supply Ability

  • Warranty(Year):1 Year

Product Specifications

Product Description

CVD tungsten is normally produced by the reduction of tungsten hexafluoride on the heated substrate in the presence of excess hydrogen. With this advanced technology, components with thin wall, small dimension or complicated structure can be produced. CVD W has a 100% dense columnar structure.  A crack free material will be produced by this process.

CVD W components can be widely used in metallurgical industry, chemical industry, electronic industry and military. Typical products include X ray target, rocket nozzle, nozzle bearing, heating element, electrode, high temperature tank, etc.

Purity

Density

Hardness

Machinability

Conductivity

>99.9%

>19.2 g/cm3

Hv 400~600

OK

Good

Type

Dimension

Length

Deposition thickness

Machinability

Capillary

ID≧0.2mm

≤50cm

≤5mm

Good

Tube

ID 5mm-100mm

≤100cm

≧0.2mm

Good

Rod

customized

≤100cm

≧0.1mm

Good

Plate

customized

≤50cm

≧0.1mm

OK

Crucible

φ≤200mm

≤40cm

≤10mm

OK

Component

customized

customized

customized

OK

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